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25 mm anodic alumina with ALD coating

AAO Wafers with ALD Coatings

$0.00 – $175.00

Nanoporous Anodic Aluminum Oxide wafers are now available with conformal coatings on the pore walls by Atomic Layer Deposition. ALD offers unmatched control of both the thickness and the composition of the coatings, as well as uniform coverage inside high aspect ratio nanopores.

Standard ALD coatings include Aluminum Oxide (Al2O3), Zinc Oxide (ZnO), Titanium Oxide (TiO2), and Platinum (Pt) with the following combinations of AAO pore diameters and ALD thicknesses:

5 nm ALD10 nm ALD20 nm ALD
25 nm pore diameterX––
50 nm pore diameterXX–
100 & 200 nm pore diameterXXX

For other AAO-ALD nanocomposites, contact us with your requirements.

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Description

PARAMETER AVAILABLE RANGE** STANDARD PRODUCTS*
ALD Materials visit ALD Technology page Al2O3, ZnO, TiO2
ALD Thickness, nm 1 – 50 5, 10, 20 (±0.2nm)
Starting Pore Diameter, nm 2 – 500 25, 50, 100, 200 (±10% + 2)
Starting Porosity, % 1 – 60 20 – 25
Wafer Size, mm 1 – 200 10, 25
Wafer Thickness, µm 5 – 200 50 (±10% + 1 µm)
* Current lead time for standard specifications is 2-3 weeks.
** Custom ALD-coated AAO products are available upon request. Visit product pages for AAO wafers and AAO Films to review available form factors and pore geometries and contact us with your coating requirements.
*** Volume discounts are available in quantities over 20 wafers. Contact us for to request a formal quotation.

Additional information

Wafer Size

10 mm diameter, 25 mm diameter
Wafer Thickness

50 µm
Pore Diameter

25 nm, 50 nm, 100 nm, 200 nm
ALD Material

Al2O3, TiO2, ZnO
ALD Thickness

5 nm, 10 nm, 20 nm

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